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| Product Name: |
TaC Coated Rotation Susceptor
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Semixlab's TaC-coated rotating substrates are specifically engineered to meet the demands of next-generation SiC epitaxial processes. Our TaC coating technology, combined with a precision-balanced rotating design, delivers exceptional thermal uniformity in high-temperature CVD environments, minimizes particle generation, and ensures long-term process stability.
At the core of this design is a dense, chemically inert tantalum carbide coating that shields the graphite substrate from hydrogen corrosion, high-temperature sublimation, and reactions with silicon- or carbon-containing precursor gases. TaC's ultra-high melting point and exceptional thermal conductivity ensure stable, uniform heat transfer during 4H-SiC epitaxy, supporting growth temperatures exceeding 1600-1700℃. By maintaining a controlled thermal field during wafer rotation, this substrate ensures uniform precursor distribution, improved laminar flow, and exceptional wafer-level uniformity in thickness and doping concentration. This is critical for power device structures like drift layers, JBS epitaxial layers, or thick high-voltage epitaxial stacks, where uniformity deviations significantly i***ct yield and electrical performance.
The TaC-coated rotating substrate is also optimized for contamination control, one of the most critical aspects in SiC epitaxy. The ultra-hard TaC surface resists microcracks, flaking, and ***lling even after extended cycling, substantially reducing particle generation within the epitaxial chamber. Its stable chemical properties minimize the introduction of metallic or carbon-based impurities, preserving epitaxial film purity and lowering defect density. These advantages substantially extend maintenance intervals, increase chamber uptime, and boost overall equipment productivity¡ªparticularly in high-volume production environments where reliability and repeatability directly i***ct total cost of ownership.
From an engineering perspective, Semixlab's substrate design leverages precise geometric balance, optimize |
| Company: |
Semixlab Technology Co., Ltd,
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| Contact: |
Mr. nick wu |
| Address: |
No.9, Qianxi Road, Zhuji City, Shaoxing City, Zhejiang Province, China |
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| Tel: |
13126863256 |
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